Pulsed laser etching, thin films

Figure 19. Pulsed excimer laser (248 nm, 30 ns) etching of high thin films (a) etch rate versus laser energy density on a linear graph (b) same data on a semi log graph cind the slope of the curve is the inverse absorption length of the light in the film (ref. 36).

Transmission Studies. To determine the influence of the optical dynamic properties on the high etch rate at 308 nm, the transmission of the laser pulse through thin polymer films was measured. 

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