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Precursors for aqueous and liquid-based processing

Precursors for Aqueous and Liquid-Based Processing of Ferroelectric Thin Films... [Pg.95]

Different strategies in the solution are described in the literature for the preparation of CSD precursors, where the prominence of the type of chemicals transcends the former grouping of solution methods. In general, but especially in the case of complex oxide compositions, neither of them can be used alone to obtain the liquid precursor due to difficulties in finding available metal reagents of the same family (e.g., alkoxides, carboxylates, and p-diketonates) for all the cations involved in the system. Therefore, a combination of several approaches is used to stabilize all the metal reagents in a common and stable solution. Some of these methods are shown here. They are divided considering the type of precursor used to obtain a stable solution, more than the traditional classification of solution methods shown above. Seven major solution processes are explained next alkoxide-based methods, carboxylate- and p-diketone-based methods, Pechini methods, diol routes, amine-based methods, polymer-assisted methods, and aqueous solution-gel methods. [Pg.846]


See other pages where Precursors for aqueous and liquid-based processing is mentioned: [Pg.277]    [Pg.203]    [Pg.85]    [Pg.636]    [Pg.433]    [Pg.433]    [Pg.431]    [Pg.120]    [Pg.274]    [Pg.305]    [Pg.30]    [Pg.326]    [Pg.243]    [Pg.53]    [Pg.856]    [Pg.23]    [Pg.138]   
See also in sourсe #XX -- [ Pg.95 , Pg.96 , Pg.97 , Pg.98 , Pg.99 , Pg.100 , Pg.101 , Pg.102 , Pg.103 ]




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Aqueous base

Aqueous liquids

Liquid based precursors

Liquid precursors

Liquid-based

Liquid-based processing

PRECURSORS AND PROCESSING

Precursor, processable

Precursors for aqueous and liquid-based

Precursors processes

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