Postdeposition treatment

Roark S.E., Rowlen K.L., Thin Ag Films - influence of substrate and postdeposition treatment on morphology and optical-properties, Anal. Chem. 1994 66 261-270. 

Topper, K. Bruns, J. Scheer, R. Weber, M. Weidinger, A. Braunig, D. 1997. Photoluminescence of CuInS2 thin films and solar cells modified by postdeposition treatments. Appl. Phys. Lett. 71 482 184. 

We can conclude this section with the insight, gained from this overview of the electrical and photoconductivity properties of these films, that, in spite of the many studies already carreid out, a comprehensive and systematic study of these properties and their correlation with a wide range of deposition parameters is still needed in order to understand what determines these properties. These studies should also include postdeposition treatments— not so much annealing, which has been carried out, but surface treatments (e.g., immersion in triethanolamine), which could show the importance (or lack of it) of the crystal surface condition. 

XPS data support this assessment of the effects. Figure 6.22 shows photoelectron spectra from the surface of several films at normal emission (90° take-off angle). It is immediately clear that the postdeposition treatments and combined gas deposition yield different surface chemistries from the as-deposited, pure TMS film. 

All of the postdeposition treatments, even treatment with the more inert gas plasmas, leave the surface of the films in a silica-like state. This is thought to be due to the creation of free radicals in the luminous gas phase, which are quickly oxidized upon exposure to the atmosphere prior to analysis. 

The etch rate of CVD oxide is generally higher than that of thermal oxide as shown in Eig. 4.2 and Eig. 4.19." It is strongly affected by the formation conditions as, for example, shown in Eig. 4.20. " It has been found that the etch rate of the LPCVD Si02 oxide in diluted HP solution is lower than conventional CVD film. In addition to the formation conditions, the etch rate of CVD oxides is determined by (I) type and concentration of the dopant, (2) condition of the postdeposition treatment, and (3) composition of etching solution. 

Control of the permeability of LPFs will play a crucial role in their possible application as sensor materials or protective coatings. The earlier-mentioned experiments show that it is possible to prepare LPFs with a variety of permeabilities. Constituent polyelectrolytes, deposition conditions, and postdeposition treatments can all be chosen to tailor a film for specific needs. 

S. E. Roark and K. L. Rowlm, Thin silver films influence of substrate and postdeposition treatment on... 

The deposition conditions, postdeposition treatment, ionic and redox sensitivity, and selected applications of the conducting polymer-based reference electrodes are summarized in Table 12.2. 

Poly(ethylene glycol) can act as both a reductant and carbon source. Compared with traditional solid-state reactions, the prepared LiFeP04/C composite has a better crystal phase, and its particle size ranges from several nanometers to several hundred nanometers. The particles are connected by a netlike carbon structure to form secondary particles. The reversible capacity is around 157 mAh/g at 0.1 C rate. No ball-milling, preparation of intermediates, presintering, or postdeposition treatment is needed. 

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