Positive-type photoresist systems

New positive-type photoresist systems based on enzymatically synthesized phenolic polymers were developed. The polymers from the bisphenol monomers... [Pg.233]

New positive-type photoresist systems based on enzymatically synthesized phenolic polymers were developed [55]. The polymers from the bisphenol monomers exhibited high photosensitivity, comparable with a conventional cresol novolak. Furthermore, this photoresist showed excellent etching resistance. The oxidative polymerization of bisphenol-A proceeded by fungal peroxidase from Coprinus cinereus (CiP) in aqueous isopropanol [56]. CiP also catalyzed the oxidative... [Pg.173]

Apart from multi-level layer resist systems, conventional positive-tone resists can be classified into two categories one-component and two-component systems. Classical examples of the former systems are polyfmethyl methacrylate), and poly (butene-1-sulfone) (2,3). Typical examples of the latter system are AZ-type photoresists, which are mixtures of cresol-formaldehyde-Novolak resins and a photoactive compound acting as a dissolution inhibitor... [Pg.339]

A positive resist system can be of either two types. The classical diazoquinone system represents a photochemical rearrangement reaction which is the basis of commercial photoresists. Scissloning or degradation of a polymer chain by light or electrons Is a later example of solubility induced change. We will examine this change in detail. [Pg.126]

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