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Positive photoresist lithographic performance

Method for a Comparative Study of Positive Photoresist Lithographic Performance... [Pg.65]

WALKER AND HELBERT Positive Photoresist Lithographic Performance 67... [Pg.67]

WALKER and Helbert Positive Photoresist Lithographic Performance 75... [Pg.75]

The structure ofthis polymer was confirmed by NMR-spectroscopy [157], Such copolymers can be formulated into a high performance positive photoresist. By comparison, a physical blend of a phenolic and poly-4-hydroxystyrene was not useful because of its slow kinetics of mixing. Therefore, the synthesis of a copolymer of both components yields a material with improved lithographic... [Pg.649]

See other pages where Positive photoresist lithographic performance is mentioned: [Pg.77]    [Pg.77]    [Pg.56]    [Pg.266]    [Pg.250]    [Pg.65]    [Pg.65]    [Pg.354]   
See also in sourсe #XX -- [ Pg.65 , Pg.66 , Pg.67 , Pg.68 , Pg.69 , Pg.70 , Pg.71 , Pg.72 , Pg.73 , Pg.74 , Pg.75 ]



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Lithographic

Lithographs

Photoresist

Photoresist lithographic performance

Photoresist photoresists

Photoresistance

Photoresists

Positive performance

Positive photoresist

Positive photoresists

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