Polysilanes thin films for electronic devices

Tacticity is required for the synthesis of crystalline thin polysilane films used for optical and semiconductor devices. Modern synthetic routes allow control over the conformation and tacticity of polysilane molecules used as precursors for thin layers of photoresists, photoconductors and nonlinear optical phases in complex semiconductor and (opto)electronic devices. These properties can be exploited only if the synthesis method ensures a minimal level of contamination, especially with oxygen and metals, and special care is taken to limit electronic-grade polysilanes to a level of contamination on the order of a few ppm in the case of oxygen and in the ppb range for metals. The reactivity of polysilane toward oxygen has forced placing the devices in a helium environment during measurement procedures.36... 

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