Polysilane films, annealed

Figure 5.11 shows cross-sectional TEM images of the annealed polysilane films on poly-Si islands. After spin coating polysilane under the same condi-... 

Figure 5.11. Cross-sectional TEM images of annealed polysilane films, (a) Amorphous Si film baked in nitrogen, (b) Two-step baked Si02 film. [Reproduced with permission from Ref. 24. Copyright 2007 Society for Information Display.]...

Fig. 28 a CD and UV spectra of chemically grafted polysilane (10) and spin-coated polysilane (32) binary film onto quartz surface before and after annealing, the initial UV absorbance of 10 was 0.04, and total UV absorbance of grafted 10/spin-coated 32 double layer was 0.39. b CD and UV spectra of spin-coated polysilane (10) on quartz surface before and after annealing, the initial UV absorbance of spin-coated 10 was 0.030... 

It is noted that the UV absorbance of the 10(g)-32(sc) sample decreased after the annealing treatment, as shown in Fig. 28a. Presumably, most polysilane chains lie down before annealing in the quartz substrate plane, as the film was prepared by the spin-coating technique. However, the thermal annealing treatment of semi-flexible 32 tends to orient some of the polymer chain segments perpendicularly and/or tilt them to the substrate plane, leading to the decrease in the apparent UV absorbance at 321 nm, as illustrated in Fig. 27. 

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