Poly monolayer crystals

Figure 3.7 Dark-field electron micrograph of a monolayer crystal of poly(4-methylpentene-l) grown from a 0.1% solution in equivolume xylene and amyl acetate solution at 90°C. Each of the four sectors has a 100 growth face contrast is described in the text. From Khoury and Barnes [7] contribution of the National Institute of Standards and Technology.

Figure 3.40 Phase contrast optical image of a monolayer crystal of poly(ethylene oxide) grown at 55°C in a 10 pm molten film. Edges of the 22 nm thick lamella are revealed by self-decoration after quenching. The 6-axis is vertical and the a -axis is horizontal this shape may be compared with that in Figure 3.9. Width of the micrograph is 150 pm. From Kovacs and Gonthier [57] with kind permission from Springer Science-tBusiness Media B.V.

Removal of contamination by ion bombardment with inert gas ions, followed by annealing. This method can be applied to either single or poly-crystalline materials and has been found to be effective for the compound indium antimonide having a melting point of 525°C as well as for more refractory materials, ft has also been found to be effective in removing a monolayer of carbon from nickel and silicon crystals. 

This work provides more evidence that at least in some cases the collapse of the monolayer represents quite a remarkable molecular rearrangement. The diffraction pattern of poly(L-methionine) shows that not only do the molecules collapse in a crystalline array but there remains a measure of preferred orientation of the crystals with respect to the water surface. This has been observed previously with poly(y-methyl-L-... 

Fig. 15 (a) A hole of a photonic crystal fiber with inner side coated with poly-L-lysine (PLL) and DNA in monolayers of thicknesses tcNA) pll and refractive indices dna. Jpll- (b) The molecular structure of poly-L-lysine with positive charges immobilized onto the negatively charged silica surface (Si02). The negatively charged DNA is immobilized on the PLL. Reprinted from [34]... 

In order to avoid the infiltration of seeds in the support and to develop ultra-thin membranes (typically 500 nm thick) with a high permeability, a masking techniques has been recently developed in Lulea University [111]. A solution of poly methyl methacrylate (PMMA) in acetone was applied and dried on the support top surface. The interior of the support was subsequently filled with wax and the protective PMMA layer was dissolved in acetone. The masked support was then seeded with a monolayer of silicalite-1 crystals before being submitted to the classical hydrothermal and calcination steps. 

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