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Poly , cross-linking negative electron resists

Poly(glycidyl methacrylate) (PGMA), a well-known negative electron beam resist first reported by Hirai et al. (55), actually functions as a positive-tone resist upon DUV exposure (Table 3.1) (56). The epoxide functionality responsible for cross-linking under electron beam exposure does not absorb in the DUV region, and the response of PGMA to DUV radiation is determined by the absorption due to the n — tt transition of the carbonyl chromo-... [Pg.134]

See other pages where Poly , cross-linking negative electron resists is mentioned: [Pg.78]    [Pg.118]    [Pg.423]    [Pg.118]    [Pg.382]    [Pg.208]    [Pg.212]    [Pg.243]    [Pg.326]    [Pg.434]    [Pg.413]    [Pg.257]    [Pg.116]    [Pg.241]    [Pg.72]   
See also in sourсe #XX -- [ Pg.191 , Pg.192 , Pg.193 , Pg.194 , Pg.195 , Pg.196 , Pg.197 , Pg.198 , Pg.199 ]



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Cross-linking negative electron

Cross-linking poly

Cross-linking resists

Cross-resistance

Crossing negative

Electron negative

Electron poly

Electron resistance

Electron resists

Electron resists negative

Electronic crossing

Electronic resistance

Electronic resistivity

Negative electron resist

Negative resist

Negative resistance

Negative resists

Negative resists resist

Poly , electronic

Poly resist

Resist cross-linked

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