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Plasma equipment

Figure 8. Schematic outline of a second-generation MC-ICPMS instrument (Nu Instalments Nu Plasma), equipped with a multiple-Faraday collector block for the simultaneous measurement of up to 12 ion beams, and three electron multipliers (one operating at high-abundance sensitivity) for simultaneous low-intensity isotope measurement. This instmment uses zoom optics to obtain the required mass dispersion and peak coincidences in place of motorized detector carriers. [Used with permission of Nu Instruments Ltd.]... Figure 8. Schematic outline of a second-generation MC-ICPMS instrument (Nu Instalments Nu Plasma), equipped with a multiple-Faraday collector block for the simultaneous measurement of up to 12 ion beams, and three electron multipliers (one operating at high-abundance sensitivity) for simultaneous low-intensity isotope measurement. This instmment uses zoom optics to obtain the required mass dispersion and peak coincidences in place of motorized detector carriers. [Used with permission of Nu Instruments Ltd.]...
The main user of these techniques at present is the electronics industry, where plasma equipment sales in 1987 are expected to... [Pg.311]

A disadvantage with conventional plasma treatment techniques is the requirement for treatments to take place in a vacuum, adding to the equipment costs. However, if a dielectric material is placed between the electrodes of the plasma equipment, then treatment can be performed at atmospheric pressure. This method is known as a dielctric barrier discharge treatment and has been the subject of some recently reported studies. [Pg.146]

With PSPIs, the photopatterning process involves significantly fewer process steps (Figure 19) and eliminates the need for expensive plasma equipment. However, the process is currently limited to aspect ratios of about 0.5 for negative features such as via holes. Higher aspect ratios can be obtained for positive features such as lines unfortunately, holes are the more-prevalent features for TFML structures. [Pg.496]

Almost the entire cost of plasma treating a yam of fabric, on a continuous basis, is in the amortization of the capital cost of the plasma equipment. That will be about 20 to 50 per hour, depending on the size of the system and the vacuum pumps, and on the utilization rate. Assuming a line speed of 160 m/min (which has been used for the continuous treatment of Kevlar yam), this is between 200 and 400 meters per dollar to at least double the strength of a composite. [Pg.264]

Application of a surface modification to a substrate before an extrusion coating or extrusion laminating operation can require combinations of corona, flame, ozone, and atmospheric plasma equipment to optimize adhesion. In some instances, a chemical primer or an adhesive layer is used to improve lamination. [Pg.49]


See other pages where Plasma equipment is mentioned: [Pg.115]    [Pg.116]    [Pg.100]    [Pg.137]    [Pg.115]    [Pg.116]    [Pg.227]    [Pg.137]    [Pg.167]    [Pg.199]    [Pg.215]    [Pg.107]    [Pg.202]    [Pg.180]    [Pg.202]    [Pg.224]    [Pg.224]    [Pg.230]    [Pg.232]    [Pg.202]    [Pg.209]    [Pg.209]   
See also in sourсe #XX -- [ Pg.202 ]




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Equipment Plasma reactor

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