Planar properties

In this paper the planarizing properties of some commercially available resins and monomers are evaluated. Other important properties such as etching resistance, film absorbance and glass transition temperature Tg are reported and discussed. Some of the materials that we evaluated are not marketed for use in the microelectronics industry. Consequently, they are not available as filtered spin coating solutions and may contain high levels of metal impurities that adversely affect device performance. 

Films of 7 3 mixtures of 1-naphthyl acrylate and ethoxylated bisphenol-A dimethacrylate had better planarizing properties than any of the resins that were examined and may be useful as layers for etchback processing. For use as bottom layers in multilayer-resist structures it will be necessary to bake the films after uv hardening to increase the Tg, and if the exposure wavelength is above 300 nm, an appropriate dye must be added to eliminate substrate reflections that degrade resolution. 

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