Photoresists specific types

Pos twe-Tone Photoresists. The ester, carbonate, and ketal acidolysis reactions which form the basis of most positive tone CA resists are thought to proceed under specific acid catalysis (62). In this mechanism, illustrated in Figure 22 for the hydrolysis of tert-huty acetate (type A l) (63), the first step involves a rapid equihbrium where the proton is transferred between the photogenerated acid and the acid-labile protecting group ... 

Finally, it must be pointed out that the close to first-order kinetic law observed in this study is by no means specific to polymerizations induced by intense laser irradiation a similar kinetic law was obtained by exposing these multiacrylic photoresists to conventional UV light sources that were operated at much lower light-intensities (27,34). This indicates that the unimolecular termination process does not depend so much on the rate and type of initiation used but rather on the monomer functionality and on the cross-link density which appear as the decisive factors. 

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