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Photolithography-photochemistry

In 1991, scientists from the Affymax Research Institute combined photolithography, photochemistry, and solid-phase synthesis in a new technology called light-directed, spatially addressable parallel synthesis this technology has been reviewed. The principal points of this technology are illustrated in Scheme 1. [Pg.867]

Two more papers in their unique and extensive series on industrial photochemistry have been produced by the Nancy group. One is a Monte Carlo modelling of light curing as applied to photolithography. The other deals with macroscopic transport effects on the performance of photochemical reactors. ... [Pg.9]

As a final example of DNA hybridization, k is important to mention the new possibility of DNA arrays created by a combination of photochemistry and photolithography. It is now possible to develc DNA diiqisr i ch contain tq> to 15,000 different DNA sequences. This pos bili is illustrated in Hgure 21.29, which is a schematic of the synthesis of tetranucleotides by photolidtographic methods. The surface can be activated by exposure to light, allowing the desired nucleotide to be synthesized at each position on the array. These chips can be incubated with the test DNA which has been labeled with fluorescent... [Pg.612]

Surface block-graft-copolymerization, based on the photochemistry of N, AT-diethyldithiocarbamate has been applied to precisely design biocompatible and functional surfaces (patterns of immobilized heparin or proteins), as well as block-grafted surfaces on polystyrene [83]. Polystyrene surfaces have also been patterned by immobilization of poly(Af-isopropylacrylamide) by photolithography, and subsequently used for regiospecific cell attachment [84]. Surface modification of polydimethylsiloxane microfluidic devices by UV induced polymer grafting improved the stability of the electroosmotic mobility and improved electrophoretic resolution of peptides [85]. [Pg.69]

The enhanced near-field of plasmon resonant metal nanoparticles has also been employed to induce local photolithography [27]. Due to the strongly confined nature of the near-field, sub-diffraction resolution is achievable. Plasmon enhanced nanolithography will be discussed in a later section. There have also been proposals on plasmon field-enhanced photochemistry and photocatalysis. [Pg.266]


See other pages where Photolithography-photochemistry is mentioned: [Pg.429]    [Pg.429]    [Pg.241]    [Pg.373]    [Pg.56]    [Pg.12]    [Pg.353]    [Pg.335]    [Pg.70]    [Pg.480]    [Pg.600]    [Pg.32]    [Pg.33]    [Pg.331]    [Pg.350]    [Pg.350]    [Pg.1330]    [Pg.1]    [Pg.435]    [Pg.436]    [Pg.436]    [Pg.462]    [Pg.603]    [Pg.604]    [Pg.1046]    [Pg.344]    [Pg.797]    [Pg.353]   
See also in sourсe #XX -- [ Pg.500 ]




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Photolithography

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