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Photolithography electron lithography compared

The commercial EB lithographic systems are very expensive compared with photolithography. For research applications, there is a common practice to convert an electron microscope into a lithography system, which significantly reduces the installation cost (Mplhave et al. 2005). Such altered systems have a linewidth on the order of 20 nm, while specialized systems have a linewidth on the order of 10 nm or smaller (Vieu et al. 2000). [Pg.434]


See other pages where Photolithography electron lithography compared is mentioned: [Pg.456]    [Pg.377]    [Pg.8]    [Pg.375]    [Pg.80]    [Pg.30]    [Pg.163]    [Pg.284]    [Pg.1178]    [Pg.313]    [Pg.206]    [Pg.245]   


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