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Phosphazene specific forms

It has been shown that allyl-amino substituted polyphosphazenes, specifically tailored to form glassy films from suitable solvents can be used for negative resist/mask applications for microlithography. As suggested by model studies, the addition of allylic double bonds to amino-substituted polyphosphazenes increases the sensitivity to radiation-induced crosslinking. However, it is probable that the stabilizing influence of the hindered amine substituent has reduced the graftabflity of these polymers. In addition, the inherent RIE resistance of the phosphazene family has been demonstrated, which underscores the possible usefulness of these systems for future resist work. Currently, other related... [Pg.300]

See other pages where Phosphazene specific forms is mentioned: [Pg.383]    [Pg.3983]    [Pg.3982]    [Pg.148]    [Pg.6]    [Pg.318]    [Pg.321]    [Pg.349]    [Pg.128]    [Pg.290]    [Pg.176]    [Pg.80]    [Pg.93]    [Pg.308]    [Pg.310]    [Pg.317]    [Pg.333]    [Pg.374]    [Pg.216]    [Pg.379]    [Pg.5]    [Pg.370]    [Pg.372]   


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Phosphazene

Specific Forms

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