Patterning of Alkanethiols by Dip Pen Nanolithography DPN

To assemble the polymers, the gold-coated substrate containing the MHA pattern and backfilled ODT was placed into a spin coater. The PS/PMMA 1% wt. solution in DMF with 50/50 weight ratio was drop cast and then spim coat at 5000 rpm for 60 seconds. The polymer assembled substrate was then placed in a glass desiccator, which contained toluene, where it was solvent annealed for 45 minufes. 

Functional Polymer Blends Synthesis, Properties, and Performance 

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