Partial pressure ranges/fluxes

The increase in the deposition rate rj (Fig. 63d) corresponds to the increase in the ion flux (Fig. 63c) the fraction of arriving ions per deposited atom, / ,, is constant at about 0.25. Such observations have also been reported by Heintze and Zedlitz [236], who furthermore suggested that the deposition rate may well be controlled by tbe ion flux. The kinetic ion energy per deposited atom, max, is also constant and amounts to about 5 eV. As was shown in Section 1.6.2.3, the material quality as reflected in the refractive index 2 eV (Fig. 63e) and the microstructure parameter R (Fig. 63f) is good 2 cv is around 4.25, and R is low (<0.1). The depletion of the silane stays constant at a value of 4.0 0.4 seem in this frequency range. The partial pressures of silane, hydrogen, disilane (1.3 x 10 - mbar), and trisilane (2 x 10 mbar) in the plasma are also independent of frequency. Similar... 

The maximum HaS facilitated flux value corresponds to an HaS permeability of 332 x 10" cm STP)cm/ cm s kPa). Matson (8) reported a HaS permeability range of 2250-3000 x 10 cm cm/(cm s kPa) for an ILM containing aqueous solution of Ka(X), for a temperature range of 363-HO3 K. The feed gas HaS partial pressure In Matson s studies was approximately 20 kPa with a total feed pressure of 2.17 x 10 kPa. Robb (22) reported an ambient temperature HaS permeability of 638 x 10 cm cm/(cm s kPa) for a silicone rubber membrane. However, polymer membranes such as silicone rubber have much lower selectlvltles than facilitated transport membranes. 

CORAL20 liquid at room temperature as a function of the average CO2 partial pressure. The data were gathered from a variety of experiments carried out with a small pilot plant including regeneration of the absorption liquid [112], As can be seen, the membrane fluxes increase with increases in the partial pressure over a wide range of CO2 partial pressures. 

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