Other Nitrides

HfN and ZrN were deposited at temperatures of 900-1000 °C, and at a low pressure of about lOTorr as well as ambient pressure [83, 84] 

Similar reactions have been reported for vanadium, niobium and tantalum nitride at temperatures higher than 900°C [85-87]. The superconducting/cc NbN was also prepared as a thin film by reacting NbCls with NH3 2 at 900°C [88, 89], The main problem is the deposition of single phase films, e.g., TaCls and ammonia produce the tetragonal phase Ta3Ns at temperatures of 600-1 000 °C [85]. 

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Handbook of Chemical Vapor Deposition 10.0 THE CVD OF OTHER NITRIDES... 

It bums in air, and is readily attacked by chlorine, phosphorus or sulfur. See other nitrides... 

See Trimethylsilyl azide Selenium halides See also Poly (sulfur nitride) See other nitrides See related N-S COMPOUNDS... 

Finely powdered material is pyrophoric on exposure to air at ambient temperature. See other NITRIDES, PYROPHORIC MATERIALS... 

Like many other nitrides, magnesium nitride is at once hydrolyzed by contact with water, and even in moist air the odor of ammonia is very noticeable about the preparation. Some of the nitrides are, however, very stable toward water, notably some of the nitrides of phosphorus and titanium. 

Other nitrides of niobium of doubtful composition have been obtained by the action of ammonia on niobium pentoxide,4 niobium oxychloride 5 and niobium pentachloride. 

See Potassium nitrate Chromium nitride See other NITRIDES ... 

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