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Optical rewritable technology display

Figure 4.9 In-cell LC twist angle change during exposure process with 125 mW/cm polarized light of high-pressure Hg lamp filtered at a peak of 440 nm [44]. The polarization angle was selected to obtain saturation for 12° and 62° LC twist angles. Reproduced from A. Muravsky, A. Murauski, X. Li, V. Chigrinov, and H.-S. Kwok, Optical rewritable liquid-crystal-alignment technology. Journal of the SID 15/4, 267-273, The Society for Information Display... Figure 4.9 In-cell LC twist angle change during exposure process with 125 mW/cm polarized light of high-pressure Hg lamp filtered at a peak of 440 nm [44]. The polarization angle was selected to obtain saturation for 12° and 62° LC twist angles. Reproduced from A. Muravsky, A. Murauski, X. Li, V. Chigrinov, and H.-S. Kwok, Optical rewritable liquid-crystal-alignment technology. Journal of the SID 15/4, 267-273, The Society for Information Display...
Figure 6.14 Microscopic picture of assembled LC-clad photonic chip in reflected non-polarized light. Left without alignment layer (with schlieren structure). Right with azo-dye SDl photoalignment layer on bottom substrate [26]. Reproduced from A. Muravsky, Optical rewritable photoalignment technology application in photonics and displays. PhD thesis proposal, HKUST (2008)... Figure 6.14 Microscopic picture of assembled LC-clad photonic chip in reflected non-polarized light. Left without alignment layer (with schlieren structure). Right with azo-dye SDl photoalignment layer on bottom substrate [26]. Reproduced from A. Muravsky, Optical rewritable photoalignment technology application in photonics and displays. PhD thesis proposal, HKUST (2008)...
A. Muravsky, Optical rewritable photoahgmnent technology application in photonics and displays. PhD thesis proposal, HKUST (2008). [Pg.155]

See other pages where Optical rewritable technology display is mentioned: [Pg.4]    [Pg.79]    [Pg.80]    [Pg.149]    [Pg.85]   
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