Optical pattern generators

The mask-making process consists of generating the pattern of the circuit on a chrome-covered quartz plate coated with a resist film. There are four types of equipment used in writing mask optical pattern generators, electron-beam writers, focused-ion-beam writers, and laser writers. Lithographic exposure of the resist-coated, chrome-covered quartz plate involves the repeated exposure of the circuit pattern with a stepper or a scanner. In earlier times, lithographic... 

Fig. 5. A The designed pattern used in microCE and B, C optical micrographs of two selected areas of the pattern that was transferred into a glass slide. D The designed pattern used in SAW device and E an SEM image of a portion of the pattern generated in silver on Si/Si02...

The use of diffractive optics for generation of the two excitation pulses results in fixed interference pattern maxima and minima at the sample,... 

While the original pattern-generation tools of the early 1970s were optical systems, in 1974, AT T BeU Laboratories introduced an electron-beam direct exposure mask-making system called MEBES," which was subsequently licensed to ETEC for commercialization. By 1980, electron-beam mask writers became... 

Fig. 33 Schematics of interference microscopy, a Two light beams, one passing through the crystal and the other through the simrounding atmosphere, b The interference microscope. c Interference patterns generated due to different optical properties of the media passed hy the two beams, d Concentration profiles calculated from the changes in interference patterns with time...

The interference patterns generated by the flexible air gap which is optically illuminated by monochromatic light [13]... 

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