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Open-Circuit Measurements

Whereas the charge-injection method is a small-amplitude perturbation method in which measurement is conducted during open-circuit decay, we now discuss a different open-circuit measurement, in which the initial overpotential is high, in the linear Tafel region. The equations we need to solve are similar to Eqs. 9K and lOK, except that the value of the current in Eq. lOK is that corresponding to the linear Tafel region, namely... [Pg.200]

Electrode reactions can be studied in poorly conducting solutions, since there is no error due to the iR potential drop in the course of an open-circuit measurement. This feature may be particularly useful for studies in nonaqueoiis solutions and at low temperatures. Although this is fundamentally correct, there are practical limitations to its applicability. To give an extreme example, one cannot follow the open-circuit decay of potential over a range of 10 mV, if the iR potential during the pulse is, say, 10 V. [Pg.503]

By the principles of thermodynamics discussed in Chapter V., a galvanic cell will yield the maximum amount of work when the production of electricity takes place reversibly, that is to say, when the changes which take place both inside and outside the cell are completely reversed when an equally strong current is sent in the opposite direction through the cell. This can only occur when the current flowing through the cell is infinitely small, so that the irreversible production of Joule heat inside the cell is avoided. The electrode potential of the cell on open circuit (measured by the compensation method, for example) is therefore a measure of the maximum electrical work which the cell can do. It is also a measure of the chemical affinity of the reaction as defined on p. 318, Chapter IX. [Pg.343]

The electrochemical activation was carried out in successive reduction and oxidation in 1 M sulfuric acid. The corresponding potentials were -t-2.40 V (oxidation) and -0.35 V (reduction) vs. reference (Ag/AgCl). After each step 10 cyclic voltammograms were recorded followed by an impedance measurement. Both methods were initiated by an open circuit measurement for 1200 s. [Pg.372]

Ussing chamber measurements are the most commonly used method to investigate transepithelial ion transport [164, 165], They can be performed on either functional epithelia from biopsies or on cultivated epithelia. The Ussing chamber itself is more or less a U-shaped chamber, which is compartmentalized by an epithelial cell layer and solute flux between both compartments can be measured. Electrogenic ion fluxes can be measured directly by short circuit measurements or calculated from open circuit measurements [165], Non-electrogenic solute flux needs continuous concentration measurements for each compartment separately [166]. Thus, Ussing chamber experiments enable to study permeation kinetics for secretion and resorption separately [166-169] and to evaluate effects on ion transport pathways [85, 87, 90, 170]. [Pg.113]

The influence of chloride ions on electrochemical behaviour of copper(II) sulphide, both in open-circuit and voltammetric experiments, is a result of the electrochemical reactions (9) and (10) of the redox reaction (8). In the case of open-circuit measurements with the increase of chloride ion concentration the increase of electrode slope is observed and can be assigned to the change of potential determining reaction from (9) to (11), As a consequence two limiting slopes are observed divalent (29.6 mV/decade) in absence of chloride ions and monovalent (59.2 mV/decade) in 1 M KCl. The voltammetric behaviour of CuS is also influenced by the same reaction, although with increase of pH reaction (12) instead of reaction (11), controls... [Pg.220]

Polymethylthiophene (PMT) films were deposited on mild steel after a special pretreatment with 2-(3-thienyl)-ethylphosphonic acid and could be overcoated with conventional topcoats or by cathodic electrodeposition [178]. The PMT film exhibited the ability to protect the substrate exposed through defects in the coating. In another report, electrodeposition of a polythiophene (PTh) film was achieved on PPy-coated mild steel. The initial layer of PPy was deposited by cyclic voltammetry from 0.3 M oxahc acid solution, followed by deposition of the PTh film (also by CV) fi om an acetonitrile solution of 0.1 M thiophene and 0.15 M LiC104. EIS, anodic polarization, and open-circuit measurements indicated anodic protection of the mild steel by the PPy/PTh film in 3.5% NaCl [179]. [Pg.1626]

The full investigation of the tribocorrosion tests requires generally the use of in situ tools like open circuit measurements, polarization measurements, current transients, impedance spectroscopy, and noise measurements, and ex situ tools like elemental surface analysis techniques, optical or electron microscopy, micro-topography, micro and nanohardness measurements texture and internal stress analyses. [Pg.97]

Figures 15.5 to 15.9 present the polarisation curves and the open circuit measurements obtained for each of the studied coatings at different times of immersion. It can be easily concluded that the behaviour of the polypyrrole film strongly depends on the doping agent. It must be underlined that the corrosion current density values cannot be regarded as the only criterion for evaluation of the coating. These films are mainly conducting which means that a considerable amount of the current density is related to the film conductivity and not only to the corrosion process. Figures 15.5 to 15.9 present the polarisation curves and the open circuit measurements obtained for each of the studied coatings at different times of immersion. It can be easily concluded that the behaviour of the polypyrrole film strongly depends on the doping agent. It must be underlined that the corrosion current density values cannot be regarded as the only criterion for evaluation of the coating. These films are mainly conducting which means that a considerable amount of the current density is related to the film conductivity and not only to the corrosion process.

See other pages where Open-Circuit Measurements is mentioned: [Pg.479]    [Pg.523]    [Pg.314]    [Pg.529]    [Pg.531]    [Pg.221]    [Pg.258]    [Pg.269]    [Pg.319]    [Pg.5]    [Pg.221]    [Pg.2515]    [Pg.2517]    [Pg.204]    [Pg.212]   


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