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Morphology etched surface

In the next part (Sec. 3.3), the morphology of the etched surfaces is discussed. It is shown that a strategy of combining kinetic, morphological, and electrochemical... [Pg.28]

The morphology of etched surfaces can be understood on the basis of the electroless mechanism and hence according to electrochemical principles. To this end, it is assumed that the two partial electrochemical reactions constituting the electroless process do not necessarily take place at the same sites, a concept which is currently used in metallic corrosion. Furthermore, since only the anodic partial current... [Pg.46]

The etch rate of quartz depends on the crystallographic orientation of the surface. Table 4.3 shows the etch rate on the surface with different orientations. The difference among the four orientations can be as large as 1000-fold. The etched surface morphology is a function of solution composition and temperature, particularly the concentration of positive ions. An etching bath with added gives terraces but no pits, a... [Pg.143]

The morphology of the etched surface depends on the composition of the solution. In general, because of the anisotropic nature of the etching of the crystal confined in a given area, perfectly smooth lateral (111) sidewalls form on both (100) and... [Pg.778]

Fig. 4 and Fig. 5 show the surface morphologies aftm photo-ablation of PMMA/pyrene, and CMS, CMS/pyrene respectively. In these figures a copper-mesh mask was used in contact with the polymer films for the gena-atkm of sharp etch patterns. For PMMA/pyrene films, in the low pyrene concentration range, the etched surface is quite rough with dendritic and needle-like structures as well as solidified droplets on the bottom of the irradiated areas present although the edges of the etched features are reasonably sharp (Fig. 4a). When the laser fiuence is increased, the etched surface becomes cleaner and more smooth. At a high pyrene concentration, clean and sharp etch patterns can be obtained at a relatively low fiuence, e.g., at a = 1.04 x 10 cm and F = 0.3 J/cm as shown in Fig. 4b. In most cases, periodic structures are observed near the edges of the wire mask, which most likely result from the optical diffraction effect of the wires. Fig. 4 and Fig. 5 show the surface morphologies aftm photo-ablation of PMMA/pyrene, and CMS, CMS/pyrene respectively. In these figures a copper-mesh mask was used in contact with the polymer films for the gena-atkm of sharp etch patterns. For PMMA/pyrene films, in the low pyrene concentration range, the etched surface is quite rough with dendritic and needle-like structures as well as solidified droplets on the bottom of the irradiated areas present although the edges of the etched features are reasonably sharp (Fig. 4a). When the laser fiuence is increased, the etched surface becomes cleaner and more smooth. At a high pyrene concentration, clean and sharp etch patterns can be obtained at a relatively low fiuence, e.g., at a = 1.04 x 10 cm and F = 0.3 J/cm as shown in Fig. 4b. In most cases, periodic structures are observed near the edges of the wire mask, which most likely result from the optical diffraction effect of the wires.
The etched surface morphologies reported in [5,9] all exhibited a surface roughness of 3000 A. This has been attributed to defects contained in the material causing local non-uniformities in the etching [5], However, it has been shown that increasing the F concentration while decreasing the pH level can result in much smoother surfaces as will be discussed further below [12],... [Pg.144]

Figure 8.20 also shows the phase morphology of the cured material. The SEM micrograph was taken from a fractured and etched surface so that remaining material is cured epoxy. The connected-globule structure can be explained as a two-phase morphology of interconnected spherical domains of the epoxy-rich phase dispersed in a PES matrix. [Pg.563]

In micromachined polysihcon structure manufacturing, galvanic corrosion is becoming an increasing problem. The relation between morphology, etch rate, surface wetting. [Pg.274]

D.C. Miller, C.R. Becker, C.R. Stoldt, Relation between morphology, etch rate, surface wetting, and electrochemical characteristics for micromachined silicon subject to galvanic corrosion, J. Electrochem. Soc. 155 (2008) F253-F265. [Pg.285]

Efch reactivity variations (specify etch and length of time). Crystal morphology crystal surface characteristics (depth of alteration) internal structure tendency for coarse cannibalism (masses greater than 5 times the average alite crystal size) inclusions. Size and abundance variations within and between clinkers. [Pg.165]

Yuan LY, Chen CS, Shyu SS, Lai JY, Plasma surface treatments on carbon fibres. 1. Morphology and surface analysis of plasma etched fibres. Composites Sci Technol, 45(1), 1-7, 1992. Commercon P, Wightman JP, Surface characterization of plasma treated carbon fibres and adhesion to a thermoplastic pol5mer, J Adhesion, 38(1-2), 55-78, 1992. [Pg.373]


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See also in sourсe #XX -- [ Pg.143 , Pg.280 , Pg.287 , Pg.296 , Pg.327 ]




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