Morphology and Layer Interfaces in OVPD

As we have described, OVPD technology enables the deposition of layers of pure materials or precise compositions of different materials, for example hosts, cohosts, and dopants. Besides layer composition, layer morphology [34], deposition rate [35, 36] and the substrate temperature [37-40] also affect device performance. Layer morphology is strongly affected by the substrate itself, but also by the deposition process and the deposition conditions. 

Forrest stressed as early as 1998 that two different types of growth regimes should be realized in this unique deposition process by variation of unique OVPD deposition parameters, for example substrate temperature, chamber pressure, and 

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