Monolayer growth

Woodward J T, Ulman A and Schwartz D K Self-assembled monolayer growth of octadecylphosphonic acid on mica Langmuir 12 3626-9... 

Underpotential deposition of heavy metals on H2 evolving electrodes is a well known problem [133], The existence of a direct correlation between H2 evolution activity and metal work function, makes UPD very likely on high work function electrodes like Pt or Ni. Cathode poisoning for H2 evolution is aggravated by UPD for two reasons. First, deposition potentials of UPD metals are shifted to more anodic values (by definition), and second, UPD favors a monolayer by monolayer growth causing a complete coverage of the cathode [100]. Thus H2 evolution may be poisoned by one monolayer of cadmium for example, the reversible bulk deposition potential of which is cathodic to the H2 evolution potential. 

Island formation multilayer versus monolayer growth... 

Very recently, Viirola and Niinisto have applied atomic layer epitaxy (ALE) to tin oxide films using SnCL [165]. The thickness increased linearly with the number of cycles yielding typical values of 0.35 A per cycle. This is a rather low value, which can be explained by a fractional monolayer growth mode instead of layer-by-layer growth. 

In multilayer production the growing Si02 film is periodically doped resulting in a sinusoidal film refractive index profile. The almost monolayer-by-monolayer growth control offers a new degree of freedom in optical coating design. 

The adsorption species was concluded to be GaCH3 under monolayer growth conditions, as detected by a real time optical monitoring method/" A possible reaction of GaCH3 with ASH3 was proposed, as shown in Equation (2). 

Panina, G.F., Monolayer growth systems multiple processes, m Animal Cell Biotechnology, Vol. 1, Spier, R.E. and Griffiths, J.B., Eds., Academic Press, London, 1985, pp. 211. 

J.T. Woodward, A. Ulman, D.K. Schwartz, Self-Assembled Monolayer Growth of Octadecylphos-phonic Acid on Mica. Langmuir (1996) Vol. 12(15) pp. 3626-3629 W. Gao, L. Dickinson, C. Grozinger, F.G. Morin, L. Reven, Self-Assembled Monolayers of Alkylphosphonic Acids on Metal Oxides. Langmuir (1996) Vol. 12(26) pp. 6429-6435. 

Note, that Figure 4c does not represent the monolayer growth kinetics at onesinglespot.Eachvalueinthegraphrepresentsa thickness at the location of each of the consecutive prints. 

Figure 22. A simplified illustration of the different growth modes of CrO and NiO on alumina, the former being an example of monolayer growth and the latter of simultaneous vertical and lateral growth [36,54], After the air treatment Cr(acac)3 is directed to react with the reactive sites on alumina, whereas Ni(acac)2 finds both the reactive sites of alumina and the OH groups of Ni available.

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