Models for dissolution rate

GR Carmichael, SA Shah, EL Parrott. General model for dissolution rates of n-component, nondisintegrating spheres. J Pharm Sci 70 1331-1338, 1981. 

Models for Dissolution Rate. Unlike the senativiiy of typical negative resists, lithographic sensitivity for a positive resist depends on relative dissolution rates of exposed and unexpos areas. A numbin of studies have been reported on tiie effect of molecular weight, M, on rate of dissolution, R. 

Simulation of Contrast Curves. In order to ulate contast curves, two models for dissolution rate dependence on molecular weight can be used. The Gamma model is based on equation 25 and the Exponential mo l is based on a modification of equation 23 with two parameters. 

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