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Modeling the Bulk Behavior of Photosensitive Blends under Non-uniform Illumination

Modeling the Bulk Behavior of Photosensitive Blends under Non-uniform Illumination [Pg.278]

The simulation box is 120 x 120 x 150 lattice sites in size and the width of the F2 region is iVst = 40 lattice sites (the positions of the lower and upper boundaries of the F2 region are at z=20 and atz = 60 respectively), (b) Morphology of binary blend in the simulation box shown in (a) at late times (t = 7 X 10 ). [Pg.278]

F] = 0.003 and F2 = 0.01. (c) Order parameter distribution within the F] region at the horizontal cross-section atz = 70. (d) Order parameter distribution within the F2 region at the horizontal cross-section at z = 40. For clarity in both (c) and (d), only a quarter ofthe y plane is shown. [Pg.278]

To facilitate our understanding of the behavior of ternary reactive mixtures under such spatially non-uniform irradiation, we first consider the response of a binary reactive blend to the same conditions. The initial condition for these simulations is a homogeneous AB mixture with a random fluctuation of the order parameter around its average value, (p) = 0. (We chose the standard deviation to be equal to 0.03 however, any reasonably small value (Cl) can be chosen.) In this simulation, [Pg.279]

2) Here, we use the notation % to specify the value of Uie order parameter in the buUq this notation is consistent with previous studies [8] and is distinctly different from the notation of % we introdu( d in Section 8.2. [Pg.279]




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Behavior model

Behavioral model

Blend uniformity

Blending behavior

Blending uniformity

Bulk behavior

Bulk blending

Illuminated

Illumination

Non-uniform

Uniform illumination

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