Microlithographic techniques

Imbihl, Kiskinova, Janek and coworkers67 have also used XPS and spatially-resolved photoelectron emission microscopy (SPEM) to investigate oxygen backspillover between YSZ and evaporated microstructured Pt films prepared using microlithographic techniques (Figure 5.38). 

In recent years, demands on microlithographic techniques have become much more severe along with the reduced sizes of semiconductor devices. Various techniques to enhance the performance of microlithographic resist systems have been developed. Contrast enhanced lithography (CEL) is one... 

Photolithography is the most commonly used microlithographic technique [2, 78]. In photolithography, a substrate, spin-coated with a thin layer of photo-... 

Combinations and arrays of UMEs are often made by the microlithographic techniques common to microelectronics, and they frequently consist of parallel bands. If the bands are connected in parallel, they behave as a single segmented electrode and follow the principles outlined in Section 5.2.3. If they are independently addressable, they can be used as separate working electrodes to characterize different regions of a sample, such as a polymer overlayer (53). 

In the last decade special attention has been paid to this type of electrode arrangement. Two eventualities appeared in electroanalytical practice. The first one is represented by assemblies of casually or regularly arranged micro- or ultramicroelectrodes. The second eventuality is realized by a set of microbands that have the length of macroscopic dimension (usually several mm of magnitude, cf. Fig. 10). These types are not microelectrodes in the proper sense of this term. They are fabricated usually by microlithographic techniques. 

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