Big Chemical Encyclopedia

Chemical substances, components, reactions, process design ...

Articles Figures Tables About

Methacrylate resist properties with developing

Variation of Cross-linked Methacrylate Resist Properties with Developing Conditions... [Pg.8]

Neoprene AF ( 963). It is a polychloroprene modified with methacrylic acid. Although it is a slow-crystallizing elastomer, the cohesive strength develops very rapidly and it has improved creep resistance at high temperature compared with Neoprene AC or AD. The improved properties of Neoprene AF are derived from the interaction between the carboxyl functionality with the metal oxides added in the solvent-borne polychloroprene adhesives. [Pg.593]

In this article we will describe two different types of positive electron-beam resists, which were briefly reported in our previous communications (2,3). One is the homopolymer or copolymer with methyl methacrylate and a-substituted benzyl methacrylate, which forms methacrylic acid units in the polymer chain on exposure to an electron-beam and can be developed by using an alkaline solution developer. In this case, the structural change in the side group of the polymer effectively alters the solubility properties of the exposed polymer, and excellent contrast between the exposed and unexposed areas is obtained. The other is a self developing polyaldehyde resist, which is depolymerized into a volatile monomer upon electron-beam exposure. The sensitivity was extremely high without using any sensitizer. [Pg.399]

See other pages where Methacrylate resist properties with developing is mentioned: [Pg.407]    [Pg.355]    [Pg.177]    [Pg.1021]    [Pg.242]    [Pg.192]    [Pg.237]    [Pg.297]    [Pg.145]    [Pg.250]    [Pg.21]    [Pg.78]    [Pg.191]    [Pg.107]    [Pg.873]    [Pg.4]    [Pg.58]    [Pg.31]    [Pg.43]    [Pg.210]    [Pg.191]    [Pg.529]    [Pg.2028]    [Pg.1039]    [Pg.1796]    [Pg.46]    [Pg.377]    [Pg.49]    [Pg.34]    [Pg.216]    [Pg.216]    [Pg.191]    [Pg.35]    [Pg.323]    [Pg.285]    [Pg.165]    [Pg.518]    [Pg.2444]    [Pg.51]    [Pg.1774]    [Pg.229]    [Pg.89]    [Pg.216]    [Pg.241]    [Pg.2692]    [Pg.3746]    [Pg.6207]   


SEARCH



Resist development

Resist methacrylate, properties with

Resist properties

Resistance development

© 2024 chempedia.info