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Metal deposition and

The major types of interferences in ASV procedures are overlapping stripping peaks caused by a similarity in the oxidation potentials (e.g., of the Pb, Tl, Cd, Sn or Bi, Cu, Sb groups), the presence of surface-active organic compounds that adsorb on tlie mercury electrode and inhibit the metal deposition, and the formation of intermetallic compounds (e.g., Cu-Zn) which affects the peak size and position. Knowledge of these interferences can allow prevention through adequate attention to key operations. [Pg.79]

In situ metallization has been claimed to provide a convenient method for the preparation of metal-deposited and metal sulfide deposited CdS during photocatalytic decomposition of aqueous sulfide. As-prepared MS/CdS and M/CdS bifunctional photocatalysts (MS = Pt or Ir sulfide M = Pt or Ir) were reported to be more active photocatalysts than CdS and ex-situ metallized CdS [285]. [Pg.277]

In the following we shall see that a more detailed picture of the structural properties of small metal deposits and their electronic interaction with the substrate can be obtained from the infrared spectra of metal carbonyls created in situ by reaction with CO from the gas phase. [Pg.120]

Fig. 2 Infrared spectra taken after metal deposition and exposure to increasing amounts of CO at a constant temperature a 0.02 ML Rh, 60 K b 0.013 ML Pd, 60 K c 0.2ML V, 90 K. CO bands present on nominally clean surfaces are due to CO adsorption from the background during sample preparation... Fig. 2 Infrared spectra taken after metal deposition and exposure to increasing amounts of CO at a constant temperature a 0.02 ML Rh, 60 K b 0.013 ML Pd, 60 K c 0.2ML V, 90 K. CO bands present on nominally clean surfaces are due to CO adsorption from the background during sample preparation...
In this context it should be mentioned that the height of the Schottky barrier depends on the proc iure of metal deposition and also on the pretreatment. Aspnes and Heller have investigated for instance metal-semiconductor contacts produced by depositing Ru, Rh or Pt as 400 A thick films. They found barrier heights for the metal in contact with air, of 0.6 eV for Ru on Ti02, which decreased to zero in the presence of hydrogen. These results are consistent with those of Yamamoto et al. . ... [Pg.103]

Bischoff, J.L. and Dickson, F.W. (1975) Seawater-basalt interaction at 200°C and 500 bars Implications for origin of seafloor heavy-metal deposits and regulation of seawater chemistry. Earth Planet. Sci. Lett., 25, 385-397. [Pg.269]

Imai, H., Takahashi, M. and Yamaguchi, M. (1996) Relation between volcanic-hosted precious and base metal deposits and geothermal systems. Resource Geology, 46, 73-97. [Pg.399]

The rotating hemispherical electrode (RHSE) was originally proposed by the author in 1971 as an analytical tool for studying high-rate corrosion and dissolution reactions [13]. Since then, much work has been published in the literature. The RHSE has a uniform primary current distribution, and its surface geometry is not easily deformed by metal deposition and dissolution reactions. These features have made the RHSE a complementary tool to the rotating disk electrode (RDE). [Pg.171]

Abstract In the last decade, the sonoelectrochemical synthesis of inorganic materials has experienced an important development motivated by the emerging interest in the nanostructures production. However, other traditional sonoelectrochemical synthesis such as gas production, metal deposits and metallic oxide films have also been improved with the simultaneous application of both electric and ultrasound fields. In this chapter, a summary of the fundamental basis, experimental set-up and different applications found in literature are reported, giving the reader a general approach to this branch of Applied Sonoelectrochemistry. [Pg.107]

In many STM studies little effort has been made to control the atmosphere within the electrochemical cell. Yet oxygen is known to exert a major role in the chemistry and corrosion of many transition metals. For example, several STM studies have used the copper/copper ion reference electrode, yet the electrode is known to be polarized from its reversible condition by oxygen, leading to significant dissolution [154]. These effects become particularly significant in the smdy of metal deposition and dissolu-... [Pg.246]

Figure5.24 Template-directed metal deposition and lift-off scheme based on a SAM defining a pattern of blocking and nonblocking thiols. Figure5.24 Template-directed metal deposition and lift-off scheme based on a SAM defining a pattern of blocking and nonblocking thiols.
Intratracheal administration to guinea pigs of 100 mg of tantalum oxide produced transient bronchitis, interstitial pneumonitis, and hyperemia, but it was not flbrogenic. There were some slight residual sequelae in the form of focal hypertrophic emphysema and organizing pneumonitis around metallic deposits, and there was slight epithelial hyperplasia in the... [Pg.654]

The overall process of metal deposition and crystal growth involves several steps. One is the diffusion of ions in the solution to the metal surface. Another is the cathodic deposition step, i.e., the removal of the ion across the interfacial region to land somewhere on a terrace on the metal surface. [Pg.590]

The discussion of concentration polarization so far has centred on the depletion of electroactive material on the electrolyte side of the interface. If the metal deposition and dissolution processes involve metastable active surface atoms, then the rate of formation or disappearance of these may be the critical factor in the overall electrode kinetics. Equation (2.69) can be rewritten for crystallization overvoltage as... [Pg.53]


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Metal deposition

Metallic metal deposits

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