Masking method

Other non-conventional masking methods include etching as defined by (1) marker ink masking and (2) laminar flow of etchants in channel. These methods were used to fabricate metal electrodes for EC detection [268]. 

Figure 6.26 SP synthesis of a 16-member library using the VLSIPS masking method.

Cluster analysis. In this section, the application of the simple multiscale approach to cluster analysis is demonstrated. The masking method will also be used to localise important features. There are several possible cluster analysis algorithms, however only discriminant function analysis (DFA) will be used here. Before discussing the results from the simple multiscale analysis, this section will first present DFA and how it can applied to both unsupervised and supervised classification, followed by how the cluster properties S are measured at each resolution level. 

Photostructuring Using the Modified Mask Method Principle... 

The modified mask method and the protection layer technology enable the simultaneous fabrication of geometrical structures of different depth, such as holes or slits and sack holes or trenches with predefined depths, in a single... 

The best photostructuring technology for the fabrication of complicated and complex structures is the modified mask method. This process enables the production of three dimensional geometrical structures (without undercut) in single processing step. Unfortunately the masks are very expensive. The produced devices are suitable for many microtechnology applications. 

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