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Mask aligner, resist images

Figure 17. Resist images delineated with a GCA DSW 4800 mask aligner. The Ag2Se/Geo.iSeo.9/// Pi two-layer inorganic RIE PCM system was used. The HPR planarizing layer was 2.5 in thickness. ((Reproduced with permission from Ref. 27 J... Figure 17. Resist images delineated with a GCA DSW 4800 mask aligner. The Ag2Se/Geo.iSeo.9/// Pi two-layer inorganic RIE PCM system was used. The HPR planarizing layer was 2.5 in thickness. ((Reproduced with permission from Ref. 27 J...
See other pages where Mask aligner, resist images is mentioned: [Pg.309]    [Pg.59]    [Pg.196]    [Pg.10]    [Pg.337]    [Pg.339]    [Pg.290]    [Pg.335]    [Pg.276]    [Pg.126]    [Pg.180]    [Pg.347]    [Pg.2713]    [Pg.1636]   
See also in sourсe #XX -- [ Pg.310 ]



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Resist image with mask aligner

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