Luminous gas phase deposition

Since the dissociation glow can be considered to be the major medium in which polymerizable species are created, the location of the dissociation glow, i.e., whether on the electrode surface or in the gas phase, has the most significant influence on where most of the LCVD occurs. The deposition of plasma polymer could be divided into the following major categories (1) the deposition that occurs to the substrate placed in the luminous gas phase (deposition G) and (2) the deposition onto the electrode surface (deposition E). The partition between deposition G and deposition E is an important factor in practical use of LCVD that depends on the mode of operation. 

Thus, the material formation in the luminous gas phase (deposition G), which is given in the form of normalized deposition rate (D.R./F Af), can be controlled by the composite parameter WjFM (normalized energy input parameter), which represents the energy per unit mass of gas, J/kg. Because of the system-dependent nature of LCVD, WjFM is not an absolute parameter and varies depending on the design factor of the reactor. The value of WjFM in a reactor might not be reproduced in a different reactor however, the dependency remains the same for all deposition G. 

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