Lithography invention

This is the second chemical amplification resist invented for use in semiconductor lithography. Invented by Willson, Frechet, and Ito, the resist on exposure spontaneously and uncontrollably depol ymerizes in an exothermic reaction that is sufficiently energetic to evaporate the monomer. These inventors were unaware of a 3M Corporation patent on a similar concept, G.H. Smith and J.A. Bonham, Photosolubilizable compositions and elements, U.S. Patent No. 3779,778 (1973). 

Before the invention of the planar transistor, many photoresist processes were developed for the manufacture of circuit boards. Experience gained in this area was rapidly transferred to silicon processing, and much of the early work in integrated circuit lithography can be traced directly to circuit board manufacturing. 

In recent years, an ever increasing number of lithographic techniques have emerged to complement optical lithography, which is still the work horse for practically all pattern replication processes. These developments are driven not only by the need for methods for the replication of sub-100 nm patterns (where conventional lithography is expected to meet its limits), but also by the invention of new high performance, low cost technologies, for example all-polymer based electronics, displays or photovoltaic devices. 

The other landmarks which happened in the middle of the 8O s were a demonstration of the possibility of appheation of the STM apparatus for lithography (Fig. b), and for controlled atom handling. The invention of AFM microscope opened the route for the construction of several different force microscopies (SPM techniques). This way the use of STM/SPM techniques as a Feynman Machine finally had been realized, the STM apprenticeship time came to an end and the time of travel begau... 

God grant that it [lithography] may soon spread all over the world that it may prove useful to mankind, and contribute to its improvement and that it may never be abused to any dishonourable or wicked purpose and I shall then never cease to bless the hour in which I invented it. 

Figure 2.2 Wooden lithographic press constructed by Alois Senefelder and used in his invention of lithography. (Published with permission from the Deutsches Museum, Munich.)...

The first steam lithographic press was invented in France in 1850 and introduced into the United States by R. Hoe around 1868. Lithographic stones were used for the image and a blanket-covered cylinder received the image from the plate and transferred it to the substrate in the steam lithographic press. Direct rotary presses for lithography using zinc and aluminum metal plates were... 

Like every other technological innovation, lithography is like a river—its growth and development depending on tributaries and on conditions it encounters on its way. The tributaries to [such] an innovation are inventions, technologies and scientific discoveries the conditions are the vagaries of the market place. 

Figure 3.1 Key developments in optical physics and chemistry that led to the invention and development of lithography. (Figure continued on next page.)...

Key Developments that Enabled the Invention and Development of Lithography... 

A con rehensive treatment of the history of chemistry has been given elsewhere. In this section, we present only the key points, stretching from the very roots of the field, through the actual beginning of the field as a distinct discipline, and ultimately to the most advanced state of the field in the present era, which are directly related to the invention, development, and evolution of lithography. 

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