Limiting current density without deposits

The temperature affects die exchange current density and the Tafel gradient, but because of relationships just mentioned above, the effect of temperature on the diffusion-limiting current density iL is often the most significant one in natural environments. On surfaces without difftision-limiting deposits, it is expressed by ... 

Controlled-potential electrolysis (CPE) represents an improvement over the previous constant-potential method this is attained by the application of an emf across the electrodes that yields a cathodic potential as negative as is acceptable in view of current density limitations and without taking the risk that the less noble metal is deposited hence the technique requires non-faradaic control of the cathodic potential versus the solution. 

Ion-beam lithography is not without its drawbacks, especially when compared to electron-beam lithography. Shot noise is a major issue for ion-beam lithography, just as it is for electron-beam lithography. Ion current densities are significantly lower than electron current densities, a limitation that is somewhat offset by the fact that each ion deposits more energy into the resist than an electron deposits, which implies that lower doses are needed to produce the same exposure effect when using ions relative to when electrons are used. °... 

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