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Kinetics catalytic etching

Woo TK, Kim SE, Ahn HS (2012b) Experimentally derived catalytic etching kinetics for defect-utilized dual-porous silicon formation. J Phys Chem C 116 7040-7049... [Pg.636]

The work at University College London by Cao and Gavriilidis was based on the use of ion etched micro-reactors made in silicon (see Figure 8.7). One of the principal reasons for the experiments was the lack of data on the kinetics of the catalytic selective oxidation of methanol to formaldehyde over a silver catalyst at relevant industrial reactor temperatures, which of course inhibits the design of reactors at the industrial scale able to match the kinetics. The reactor used had a channel of 600 microns in width and the depth is determined by the etching time. [Pg.234]


See other pages where Kinetics catalytic etching is mentioned: [Pg.624]    [Pg.480]    [Pg.413]    [Pg.221]    [Pg.217]    [Pg.2207]    [Pg.59]    [Pg.105]    [Pg.113]    [Pg.311]    [Pg.104]    [Pg.167]   
See also in sourсe #XX -- [ Pg.379 , Pg.380 , Pg.381 , Pg.382 ]




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