Ion implantation in CMOS Technology Machine Challenges

Contributed by Aditya Agarwal1, Hans-Joachim Gossmann1, Michael Graf, Thomas Parrill2, Leonard Rubin, and John Poate3 (Axcelis Technologies, Inc.) 

The sophistication of implant machines and the devices they produce have evolved continuously over the past 50 years, and this chapter will give a flavor of the state-of-the-art of the technology and current challenges. At the same time, the economic challenges or drivers cannot be overemphasized. Economics have been an important factor in ion implantation from its inception in chip manufacturing because the implanter cost was incremental to the diffusion systems with which implant competed (McKenna 2000 Rose 1985). 

Silicon technology drives the modern world. A manifestation of its importance is Moore s Law, which describes the continuous shrinking of devices to improve performance and cost. Tremendous investment is required to meet the demands of 

Moore s Law. Some of those demands, such as reducing implant energies, are described in this chapter. 

Contributed by Aditya Agarwal Hans-Joachim Gossmann Michael 

---