In-System Synchrotron Radiation Photoelectron Spectroscopy

The second term on the right-hand side of Equation 2.44, the chemical shift, is given by the effective charge of the considered atom and by the influence of the neighboring atoms. In a simple spherical charge model, this energy change can 

SRPES allows one to tune the photon energy to the desired surface sensitivity within the limits of XPS. As the mean inelastic scattering length for photoelectrons 

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Among the related methods, specific experimental designs for applications are emphasized. As in-system synchrotron radiation photoelectron spectroscopy (SRPES) will be applied below for chemical analysis of electrochemically conditioned surfaces, this method will be presented first, followed by high-resolution electron energy loss spectroscopy (HREELS), photoelectron emission microscopy (PEEM), and X-ray emission spectroscopy (XES). The latter three methods are rather briefly presented due to the more singular results, discussed in Sections 2.4-2.6, that have been obtained with them. Although ultraviolet photoelectron spectroscopy (UPS) is an important method to determine band bendings and surface dipoles of semiconductors, the reader is referred to a rather recent article where all basic features of the method have been elaborated for the analysis of semiconductors [150]. 

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