In situ applications of ATR-FTIR spectroscopy using mSREs

6 In situ applications of ATR-FTIR spectroscopy using mSREs 

The following examples will be treated to highlight the universal applicability of mSREs for investigating CMP of Si02 and other dielectrics. The technical implementation of mSREs in the measuring system and investigafions of the oxide removal by chemical etch and CMP, characterization of slurries and surface modificafions as well as interactions with the pad are presented. 

From Schumacher et al. (2010a), reprinted with permission of the Society for Apphed Spectroscopy. 

3 Chemical etch and thickness calibration of S1O2 layers on mSREs 

In the case of oxide CMP, several hundred nanometre thick Si02 layers are of special importance and a large number of ex situ IR investigations on Si wafers were reported 

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