Hydrogenated carbon films, plasma

Koidl, R, Wild, Ch., Dischler, B., Wagner, J., and Ramsteiner, M., Plasma Deposition, Properties and Structure of Amorphous Hydrogenated Carbon Films, Mater. Sci. Forum, Vol. 

Kroesen, G.M.W. Schram, D.C. van de Sande, M.J.F. Fast deposition of amorphous hydrogenated carbon films using a supersonically expanding arc plasma. Plasma Chem. Plasma Process. 1990, 10, 49. 

Growth, Structure, and Properties of Plasma-Deposited Amorphous Hydrogenated Carbon-Nitrogen Films... 

Growth, Structure, and Properties of Plasma-Deposited Amorphous Hydrogenated Carbon-Nitrogen Films D. F. Franceschini, Institute de FIsica, Uni-versidade Federal Fluminense, Avenida Litoranea s/n, Niteroi, RJ, 24210-340, Brazil... 

Of course, oxygen is not the only impurity that will react with beryllium. Another material that is important in forming mixed-material layers with beryllium is carbon. The saturated value of retention that has been found in beryllium surfaces exposed to a large deuterium ion fluence could easily be overshadowed if a carbon rich layer forms on the beryllium surface due to impurity carbon ions in the incident plasma flux. The hydrogen retention properties of plasma deposited carbon films has been shown to dominate the total retention in beryllium samples exposed to the plasma at lower temperature. Once the sample temperature during exposure approaches 500°C there is little difference between the retention in Be/C mixed-material layers compared to clean beryllium samples [48]. The temperature dependence of the retention of carbon containing mixed material layers, as well as that of clean beryllium surfaces is shown in Fig. 14.10. There are two possible explanations for the reduced retention in the mixed-material layers formed at elevated temperature. The first is that beryllium carbide forms more readily at elevated temperature and less retention is expected in beryllium carbide [11]. The second is that carbon films deposited at elevated temperature also tend to retain less hydrogen isotopes [49]. 

Carbon films prepared from certain anhydrides, such as maleic anhydride, by plasma deposition show a trace of oxygen and hydrogen. IR spectra are suitable for analyzing their structure as deposited at different temperatures (Fig. 57). 

Chou, L. H., and Wang, H. W., On the microstructural, optical, and thermal properties of hydrogenated amorphous carbon films prepared by plasma enhanced chemical vapor deposition, J. Appl. Phys., 74, 4673-4680 (1993). 

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