Hydrogen with boron film

Tsuzuki, K., Eiki, H., Inoue, N., Sagara, A., Noda, N., Hirohata, Y, Hino T. 1999. Hydrogen absorption/desorption behavior with oxygen contaminated boron film. J Nuclear Mat 266-269 247-250. 

The cell employed for the electrolytic production of NF3 was a cylindrical nickel cell of 1.5 dm in volume. A BDD with boron concentrations of 2500, 5000, 7500, 8000,10 000, and 12 500 ppm was used as the anode for the electrolytic production of NF3. For galvanostatic measurement of the anode polarization curve, a carbon anode (FE-5 Toyo Tanso Co., Ltd.) was also used in addition to the BDD anode. The BDD thin film (Permelec Electrode Ltd.) was prepared by the hot filament chemical vapor deposition (HFCVD) method on a carbon substrate using a gas mixture composed of CH4-H2-B(CH30)3-Ar. The anode was located at the center of the cell and the cell wall was utilized as the cathode. A nickel rod of 0.1 cm surface area pre-treated with anodic oxidation in a dehydrated NH4F-2HF melt was used as the reference electrode. The nickel rod functions as NiF Oy/Ni (0.073 V versus RHE) [4]. A PTFE skirt was provided between the anode and the cathode compartments, and the anode gas was separated from hydrogen evolved at the cathode to prevent an explosion. The cell bottom was covered with a PTFE sheet to avoid hydrogen evolution. 

Fig. 8. Effect of an oxide film on the subsurface hydrogen concentration produced by a given exposure to plasma gases. The two curves refer to deuteration for 1 hr at 150°C of samples with a boron concentration of 1017 cm-3, one with and one without an oxide layer. 

Fig. 3.8 Typical cyclic voltammogram of boron doped diamond film electrode. The result was tested in 0.5 M H2SO4 solution at 0.1 V s 1 scan rate. The standard hydrogen gas and oxygen gas evolution potentials were marked with E t and Eq2, respectively (after Guo and Chen 2007b)...

---