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Hydrogen and Acceptor Compensation in GaN

FIGURE 1 Formation energies as a function of Fermi level for IT, H° and H (solid lines), and for an H2 molecule (dashed line) in GaN [1], EF - 0 corresponds to the top of the valence band. [Pg.317]

In p-type GaN, H behaves as a donor (Ft) it thus compensates acceptors. The preferred location for FT is at the antibonding site behind a nitrogen atom. The diffusion barrier for FT is only 0.7 eV, which indicates a high diffUsivity at moderate to high temperatures. In n-type GaN, H behaves as an acceptor (H ) its most stable site is at the antibonding site behind a Ga atom. The migration barrier for FT is [Pg.317]

indicating a very low diffusivity. For Fermi-level positions below 2.1 eV FT is favoured higher Fermi-level positions favour H The neutral charge state is never stable [1]. This is characteristic of a so-called negative-U centre. [Pg.318]

FIGURE 1 also shows the formation energy of H2 molecules in GaN. It is clear that H2 is unstable with respect to dissociation into monatomic hydrogen. [Pg.318]

The behaviour of isolated interstitial hydrogen, as discussed in Section B, provides crucial information about interaction with impurities. Since both the solubility and the diffusivity of hydrogen in n-type GaN are low, hydrogen-donor complexes will rarely form, and we focus on complexes with acceptors. [Pg.318]


A8.7 Yellow luminescence in GaN A8.8 Hydrogen and acceptor compensation in GaN A8.9 3d transition metals in GaN and related compounds A8.10 Er-doped GaN and AIN... [Pg.273]

Soon, Nakamura et al. (9) proposed a hydrogenation process whereby acceptor-H neutral complexes are formed in >-type GaN films as a compensation mechanism. Low-resistivity p-type GaN films, which were obtained by N2-ambient thermal annealing or LEEBI treatment, showed a resistivity as high as 1 X 10 Q cm after NHs-ambient thermal annealing at temperatures above 600°C. In the case of N2-ambient thermal annealing at temperatures between room temperature and 1000°C, the low-resistivity p-type GaN films showed no change in resistivity, which was almost constant between 2 and 8 Q cm, as shown in Fig. 11. [Pg.723]


See other pages where Hydrogen and Acceptor Compensation in GaN is mentioned: [Pg.317]    [Pg.318]    [Pg.319]    [Pg.320]    [Pg.321]    [Pg.317]    [Pg.318]    [Pg.319]    [Pg.320]    [Pg.321]    [Pg.466]    [Pg.709]    [Pg.290]    [Pg.290]    [Pg.319]    [Pg.319]    [Pg.321]    [Pg.587]    [Pg.715]    [Pg.723]    [Pg.725]    [Pg.181]    [Pg.300]   


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