Lithography graft polymerization

There exist several realizations of the graft-polymerization lithography (GPL). 

To improve effectiveness of graft-polymerization and to decrease complexity of the lithography method, it is advantageous to use liquid or solid-phase polymerization strategies. One of the solving is to deposit a silicon-containing monomer onto a selectively exposed photoresist and then to heat it. The monomers will polymerize and an excess of them can be removed from the photoresist. The mask obtained can be used for the RIE in... 

Figure 2.6 Control of the graft polymerization as determined with step height measurements of the brush dry tMckness. ETFE substrates were activated with EUV interference lithography. In most cases, the data points roughly follow a square root dependence on the exposure dose. The brush thickness was also influenced by (A) the pH of the graft solution (aqueous solution of methacrylic acid), (B) the viscosity of the solution (GMA in dioxane), controlled by addition of PEG, and (C) the addition of a RAFT agent to the monomer solution (GMA in methylethyl ketone). For details, see the text. Source Figure compiled from Neuhaus et al. [14] and Parquet et al. [15,16] with permission from Elsevier Ltd. and ACS.

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