Glow discharges composition

Mass spectrometer studies of oxidant additions to fluoro- and chlorocarbon gases have demonstrated that the relative reactivity of atoms with unsaturate species in a glow discharge follows the sequence F -- O > Cl > Br (41), Of course, the most reactive species present will preferentially undergo saturation reactions that reduce polymer formation and that may increase halogen atom concentration. Ultimately, determination of the relative reactivity of the plasma species allows prediction of the primary atomic etchants in a plasma of specific composition. 

When alkylsilanes such as methylsilane, dimethylsilane, trimethylsilane, tetra-methylsilane, and hexamethyldisilane polymerize in a glow discharge, the stoichiometry, chemical structure, and properties of the resulting polymers generally depend on the discharge conditions (2, 8, 21, 22], Elemental compositions from XPS for plasma trimethylsilane polymers deposited under different... 

Figure 5. Observed change in the elemental surface composition of hydrocarbon-covered 304 stainless steel and Inconel as a function of exposure to hydrogen discharge cleaning. The stainless steel sample was exposed to glow discharge cleaning in the PDXTokamak (Ref. 37J and the Inconel sample was exposed to pulse discharge cleaning in the TFR Tokamak. Key , C SS substrate A, O SS substrate ...

Figure 1 Glow discharge mass spectrometry (GD-MS) spectrum of a mixture of rare earth oxides compacted in a tantalum host matrix. Oxide composition 5% by weight in disk, each element present at 110 ppm. (From Ref. 39.)...

Figure 1. A nonrelativistic window of the temperature—composition plane, showing electron density (n) and temperature (T). Normal conditions (on earth) for semiconductors and elemental metals and conditions on the Sun, Jupiter, and the White Dwarf are shown. Experimental methods in A, B, C, and D are Tokamak, glow-discharge, laser fusion, and degenerate strongly coupled plasma, respectively. Wigner—Seitz radii, rs, are also shown (adapted from Redmei4).

Oxyfluoropolymers-adhesive composites have also been prepared by Vargo [3] using a radio frequency glow discharge of polytetrafluorineethylene. 

The deep profile of a coated graphite probe, which was taken by glow discharge optical spectroscopy, shows that considerably more Si than C was coated. It means that no pure SiC was formed under the given conditions. It is shown at the deep profile (Fig. 2) the temperature has a significant influence on the composition of layer and the kinetics of deposition (temperature can be entered on the deep axis). 

Vacuum 830°C, 20 min/oil/air 180°C, 2 h. Even austenitizing temperatures above the CVD temperatures cause almost no changes in the chemical compositions of the D2 substrate and TiN coating as measured by GDOS (glow discharge optical spectroscopy), if the post CVD... 

When an organic vapor rather than an inert gas is used in the same discharge reactor, a nearly completely different phenomenon occurs, in which deposition of material is an aspect. Deposition of material constitutes the foundation of LCVD. In an LCVD environment, the composition of the gas phase changes continuously as deposition proceeds. This difference could be further illustrated by examples for glow discharge of argon and of acetylene. 

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