F2 Mixtures as CVD-chamber Cleaning Gas

F2 mixtures with nitrogen and/or Argon offer a market available, environmentally friendly alternative to the greenhouse active gases NF3, CF4, CHF3 and SFs, which are used beside perfluorocarbons as standard material for the time being. 

In accordance with its conductivity IF5 is an ionizing solvent. After reaction with Lewis acids or Lewis bases the corresponding salts are formed. 

Scott and Bunnett [36] have shown that IF5 is partially soluble in the organic Lewis-base 1,4-Dioxane, and that the addition of an excess of IF5 results in the precipitation of colourless dioxanate crystals. With various other electron donors (e.g. pyridine) similar 1 1 molecular complexes are also formed. 

The main application of IF5 is in the production of fluoroalkyl iodides [38]. These are valuable intermediates in the synthesis of perfluoralkylated organic compounds used as fluororsurfactans and textile finish [39]. 

IF5 is also sometimes used for etching processes in the semiconductor industry. 

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