Ester protected chemical amplification resists

Acetals and ketals have attracted a great deal of attention recently as protecting groups of PHOST due to their lower activation energies of deprotection than fBOC and terf-butyl esters. While the majority of chemical amplification resists require PEB to accelerate acid-catalyzed reactions, deprotection of ac-... 

It is well known that adamantane forms effective chemical amplification resistance, as shown in Chapter 2. The ester of methyladamantane is synthesized with phenol, as shown in Figure 3.17. Therefore, noria protected by adamantane can be obtained by the same reaction with Figure 3.17. A typical procedure of synthesis of noria protected by adamantane is shown below. ... 

A new type of copolymer resist named ESCAP (environmentally stable chemical amplification photoresist) has recently been reported from IBM [163], which is based on a random copolymer of 4-hydroxystyrene with tert-butyl acrylate (TBA) (Fig. 37), which is converted to a copolymer of the hydroxystyrene with acrylic acid through photochemically-induced acid-catalyzed deprotection. The copolymer can be readily synthesized by direct radical copolymerization of 4-hydroxystyrene with tert-butyl acrylate or alternatively by radical copolymerization of 4-acetoxystyrene with the acrylate followed by selective hydrolysis of the acetate group with ammonium hydroxide. The copolymerization behavior as a function of conversion has been simulated for the both systems based on experimentally determined monomer reactivity ratios (Table 1) [164]. In comparison with the above-mentioned partially protected PHOST systems, this copolymer does not undergo thermal deprotection up to 180 °C. Furthermore, as mentioned earlier, the conversion of the terf-butyl ester to carboxylic acid provides an extremely fast dissolution rate in the exposed regions and a large... 

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