Electron resists chloromethylated polystyrene

Pulse Radiolysis Studies on the Mechanism of the High Sensitivity of Chloromethylated Polystyrene as an Electron Negative Resist... 

Recently chloromethylated polystyrene (CMS), a highly sensitive, high resolution electron resist with excellent dry etching durability, was developed. Very recently reactive intermediates in irradiated polystyrene, which is a starting material of CMS, have been studied and the transient absorption spectra of excimer (2-4), triplet states (2,5), charge-transfer complexes, and radical cations (6) of polystyrene have been measured. The present paper describes the cross-linking mechanism of the high sensitivity CMS resist and compares it to that of polystyrene on the basis of data on reactive intermediates of polystyrene and CMS. 

Chloromethylated polystyrene and chloromethylated poly(a-methyIstyrene) are negative type resists having high sensitivity and high resolution. In the pulse radiolysis of solid films of this polymer, the absorption spectra of substituted benzyl-type polymer-radical and the charge transfer complex between phenyl rings and chlorine atoms were observed (Fig. 17) [59], The benzyl-type radical may be produced by the dissociative electron attachment to the benzyl part of chloromethylated polystyrene (CMS). 

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