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Negative electron resist chloromethylated polystyrene

Pulse Radiolysis Studies on the Mechanism of the High Sensitivity of Chloromethylated Polystyrene as an Electron Negative Resist... [Pg.151]

Chloromethylated polystyrene and chloromethylated poly(a-methyIstyrene) are negative type resists having high sensitivity and high resolution. In the pulse radiolysis of solid films of this polymer, the absorption spectra of substituted benzyl-type polymer-radical and the charge transfer complex between phenyl rings and chlorine atoms were observed (Fig. 17) [59], The benzyl-type radical may be produced by the dissociative electron attachment to the benzyl part of chloromethylated polystyrene (CMS). [Pg.73]


See other pages where Negative electron resist chloromethylated polystyrene is mentioned: [Pg.112]    [Pg.112]    [Pg.65]    [Pg.9]    [Pg.423]    [Pg.37]    [Pg.151]    [Pg.434]   


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Chloromethyl

Chloromethyl polystyrene

Chloromethylated

Chloromethylation

Electron negative

Electron resistance

Electron resists

Electron resists chloromethylated polystyrene

Electron resists negative

Electronic resistance

Electronic resistivity

Negative electron resist

Negative resist

Negative resistance

Negative resists

Negative resists resist

Resistant Polystyrene

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