Electron lithography photolithography compared with

The commercial EB lithographic systems are very expensive compared with photolithography. For research applications, there is a common practice to convert an electron microscope into a lithography system, which significantly reduces the installation cost (Mplhave et al. 2005). Such altered systems have a linewidth on the order of 20 nm, while specialized systems have a linewidth on the order of 10 nm or smaller (Vieu et al. 2000). 

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