Electrocrystallization of low-dimensional

The preparation of crystalline low-dimensional molecular solids, commonly is performed by electrocrystallization techniques wherein redox active molecules are reduced or oxidized at a working electrode in the presence of appropriate counterions. Very little is known, however, about the effect of electrochemical parameters and interfacial structure on the self assembly processes that lead to crystallization on the electrode surface. This work will describe the electrocrystallization of various crystalline molecular solids, focusing on the control of nucleation, growth, morphology and stoichiometry of these materials through manipulation of the electrochemical growth conditions and interfacial properties of the electrode. 

The monoatomic high-step edges, the microsteps, are required for continuous metal electrocrystallization. Possible sources of microsteps on a surface are shown in Figs. 2.7, 2. 8a, and 2.9a, i.e., the low-index planes, two-dimensional nuclei, emergent screw dislocations, and indestructible reentrant grooves [11, 32]. 

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