Electroceramic thin films

Klee M., Mackens U., Pankert X, Brand W., Klee W., Sci and Technol. of Electroceramic Thin Films, ed. Auciello O., Waser R, Kluwer, Dordrecht, 1995, p. 99. 

R. W. Whatmore, R Kirby, A. Patel, N. M. Shorrocks, T. Bland, M. Walker, Proc. NATO Advanced Research Workshop on Science and Technology of Electroceramic Thin Films, O. Auciello and R. Waser eds., Kluwer Academic Publishers, Dordrecht, The Netherlands, 383, 1994. 

Waser, R., Guest Ed., Special issue on Electroceramic thin films—integration technologies and device concepts, J. Electroceram., 3, 103, 1999. 

SUT 95] SUTTA P., JACKLIAK Q., TVAROZEK V., NOVOTNY I., X-ray diffraction line profile analysis of ZnO thin films deposited on Al-Si02-si substrates . Science and technology of electroceramic thin films, Kluwer Academic Publishing, p. 327-334,1995. 

Gaucher P, Hector J, Kurfiss JC. AucieUo O, Waser R, editors. Science and technology of electroceramic thin films, vol. 147. Netherlands Kluwer, 1995. 

Rupp JEM (2012) Itmic diffusion as a matter of lattice-strain f(OT electroceramic thin films. Solid State... 

Figure 27.1 Conversion of a solution-deposited layer into an electroceramic thin film by thermal treatment Singular characteristics of thin films are Indicated in this scheme. These...

Figure 27.2 shows the photographs of sol-gel precursors and thin films prepared by CSD. This chapter presents a snapshot of the current status and key challenges in the field of electroceramic thin films processed by sol-gel. This chapter is mainly focused on metal oxide films, which are the most lucrative films prepared by CSD with the widest use in electroceramic devices. However, non-oxide materials have also been prepared by sol-gel and detailed overviews on them were reported by Kamiya [5,6], Fujihara [7], and Almeida and Xu [8]. 

Chemical Solution Deposition of Electroceramic Thin Films... 

The development of sol-gel chemistry for the fabrication of oxide thin films by CSD started first in the 1980s with the deposition of transparent coatings of silica layers [9,10]. Immediately after these works, the CSD preparation of crystalline complex oxide thin films was reported, first by Fukushima [11] for BaTiOs films and a year later by Budd et al. [12] for PbTiOs and PbZrOs films. Since then, CSD has been widely used for the preparation of electroceramic thin films. 

Chemical Solution Deposition of Electroceramic Thin Films 1845 Table 27.2 Deposition techniques of thin films. 

Figure 27.4 Some of the coating techniques most used for the preparation of electroceramic thin films.

Dip coating and spray coating have an important advantage over spin coating, that is, the large-area deposition of substrates, which is extremely important in some applications of electroceramic thin films, such as those related to macroelectronics and flexible electronics [37,38]. In addition, spray coating provides the opportunity of the preparation of nonplanar shapes (e.g., steps, stacks, or trenches). 

Figure 27.8 Thermal treatment used for the crystallization of electroceramic thin film (a) conventional heating using slow heating rates (some °C min ) and (b) rapid thermal processing...

Figure 27.13 Effect of the heating rate of the thermal annealing on the heterostructure of the electroceramic thin film, (a) RBS spectra of two (Ca, PbiTiOs thin films prepared from the same precursor solutions but crystallized with different thermal annealing rates ...

The near future apphcations of electroceramic thin films demand materials with specific characteristics that are challenging for films prepared by solution... 

A Current Challenges for Solution-Derived Electroceramic Thin Films 873 (3) I 85 nm thick film ( ) 1-25 nm thick film... 

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